Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2006-06-07
2008-12-23
Kelly, Cynthia H (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S914000, C430S287100, C430S281100, C430S322000, C430S449000, C526S281000, C526S271000, C522S121000, C522S125000, C522S114000
Reexamination Certificate
active
07468235
ABSTRACT:
Provided are a barrier coating composition and a method of forming photoresist pattern by an immersion photolithography process using the same. The barrier coating composition includes a polymer corresponding to formula I having a weight average molecular weight (Mw) of 5,000 to 100,000 daltons and an organic solvent,wherein the expressions 1+m+n=1; 0.1≦1/(1+m+n)≦0.7; 0.3≦m/(1+m+n)≦0.9; and 0.0≦n/(1+m+n)≦0.6 are satisfied; Rf is a C1to C5fluorine-substituted hydrocarbon group; and Z, if present, includes at least one hydrophilic group. Compositions according to the invention may be used to form barrier layers on photoresist layers to suppress dissolution of photoresist components during immersion photolithography while allowing the barrier layer to be removed by alkaline developing solutions.
REFERENCES:
patent: 5445919 (1995-08-01), Wakata et al.
patent: 6277538 (2001-08-01), Choi et al.
patent: 6517990 (2003-02-01), Choi et al.
patent: 2004/0259025 (2004-12-01), Barclay et al.
patent: 2005/0042554 (2005-02-01), Dierichs et al.
patent: 2005/0202351 (2005-09-01), Houlihan et al.
patent: 2005-099646 (2005-04-01), None
patent: 2005-099648 (2005-04-01), None
Ralph R. Dammel et al.,193 nm Immersion Lithography—Taking the Plunge, J. of Photopolymer Science and Technology, 2004, vol. 17, No. 4, pp. 587-602.
Choi Sang-Jun
Hata Mitsuhiro
Ryoo Man-Hyoung
Harness & Dickey & Pierce P.L.C.
Kelly Cynthia H
Rummel Ponder N Thompson
Samsung Electronics Co,. Ltd.
LandOfFree
Barrier coating compositions containing fluorine and methods... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Barrier coating compositions containing fluorine and methods..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Barrier coating compositions containing fluorine and methods... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4030520