Backside etching in a scrubber

Details Backside etching in a scrubber Backside etching in a scrubber

2005-07-26

2005-07-26

Hassanzadeh, P. (Department: 1763)

Etching a substrate: processes

Nongaseous phase etching of substrate

Using film of etchant between a stationary surface and a...

C216S092000, C134S902000

Reexamination Certificate

active

06921494

ABSTRACT:
A scrubber device is provided. The scrubber device may etch a backside of a wafer and may clean a frontside of the wafer simultaneously. The scrubber device may comprise a programmed controller adapted to supply a non-etching fluid to a frontside of the wafer whenever an etching fluid is supplied to the backside of the wafer.

REFERENCES:
patent: 5675856 (1997-10-01), Itzkowitz
patent: 5709755 (1998-01-01), Kuo et al.
patent: 5716458 (1998-02-01), Machino
patent: 5853522 (1998-12-01), Krusell et al.
patent: 5904301 (1999-05-01), Kajiyama et al.
patent: 6063232 (2000-05-01), Terasawa et al.
patent: 6080675 (2000-06-01), Prall et al.
patent: 6187684 (2001-02-01), Farber et al.
patent: 6202658 (2001-03-01), Fishkin et al.
patent: 6277203 (2001-08-01), Jiang et al.
patent: 6290865 (2001-09-01), Lloyd et al.
patent: 6427566 (2002-08-01), Jones et al.
patent: 6592677 (2003-07-01), Tomimori et al.
patent: 6711775 (2004-03-01), Mikhaylich et al.
patent: 6733594 (2004-05-01), Nguyen
patent: 0 837 493 (1998-04-01), None
patent: 0999012 (2000-10-01), None
patent: 63-221627 (1988-09-01), None
patent: 4-949537 (1992-03-01), None
patent: 10-335283 (1998-12-01), None
patent: WO 00/03419 (2000-01-01), None
patent: WO 00/33368 (2000-06-01), None

Affiliated with

Also associated with

Rating

Backside etching in a scrubber does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Backside etching in a scrubber, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Backside etching in a scrubber will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3396568