Back sputtering shield

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering

Patent

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Details

20429812, 20419212, C23C 1434

Patent

active

060456701

ABSTRACT:
An improved target assembly for a deposition chamber wherein the backing plate which mounts a metal target has a groove for receiving a target shield. The target shield can be replaced during normal cleaning operations without replacement of the remainder of the target assembly. The target shield can be used with targets having tapered edges.

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patent: 5538603 (1996-07-01), Guo
patent: 5540821 (1996-07-01), Tepman
patent: 5632873 (1997-05-01), Stevens et al.
patent: 5635036 (1997-06-01), Demaray et al.
Austrian Patent Search Report Dated Oct. 23, 1998.

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