Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1997-01-08
2000-04-04
McDonald, Rodney G.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20429812, 20419212, C23C 1434
Patent
active
060456701
ABSTRACT:
An improved target assembly for a deposition chamber wherein the backing plate which mounts a metal target has a groove for receiving a target shield. The target shield can be replaced during normal cleaning operations without replacement of the remainder of the target assembly. The target shield can be used with targets having tapered edges.
REFERENCES:
patent: 4472259 (1984-09-01), Class et al.
patent: 4525262 (1985-06-01), Class et al.
patent: 4933063 (1990-06-01), Katsura et al.
patent: 4966676 (1990-10-01), Fukasawa et al.
patent: 5271817 (1993-12-01), Brugge et al.
patent: 5328582 (1994-07-01), Cole
patent: 5334298 (1994-08-01), Gegenwart
patent: 5391275 (1995-02-01), Mintz
patent: 5538603 (1996-07-01), Guo
patent: 5540821 (1996-07-01), Tepman
patent: 5632873 (1997-05-01), Stevens et al.
patent: 5635036 (1997-06-01), Demaray et al.
Austrian Patent Search Report Dated Oct. 23, 1998.
Adams Bret
Hamilton Gregory N.
Applied Materials Inc.
McDonald Rodney G.
LandOfFree
Back sputtering shield does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Back sputtering shield, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Back sputtering shield will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-361476