Automatic photomask inspection method and system

Details Automatic photomask inspection method and system Automatic photomask inspection method and system

1981-03-31

1984-05-15

Rosenberger, R. A.

Optics: measuring and testing

By configuration comparison

With comparison to master, desired shape, or reference voltage

356237, G01B 1114

Patent

active

044485328

ABSTRACT:
A method and apparatus for receiving two sets of digitized scan data from two optical detectors which simultaneously scan two supposedly identical portions of a photomask for comparing the two sets of scan data to detect defects, and for evaluating the defect data to determine whether or not it represents real defect information or false defect information. Scan lines containing defect data are scanned twice to produce two sets of defect data and the two sets are then compared to produce a real defect data set including only defects detected in both scans. False defects are thus eliminated from the final data set.

REFERENCES:
patent: 4133504 (1979-01-01), Dobler et al.
patent: 4247203 (1981-01-01), Levy et al.
patent: 4347001 (1982-08-01), Levy et al.
Droege et al., "Hole Count Verifier", IBM Technical Disclosure Bulletin; vol. 2, No. 4, (Dec. 1959), pp. 98-100.

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