Automatic optical proximity correction (OPC) rule generation

Details Automatic optical proximity correction (OPC) rule generation Automatic optical proximity correction (OPC) rule generation

2006-10-17

2006-10-17

Do, Thuan (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C716S030000, C716S030000, C716S030000

Reexamination Certificate

active

07124395

ABSTRACT:
A method of automatically applying optical proximity correction techniques to a reticle design containing a plurality of features. The method comprises the steps of: (1) generating a first set of rules for applying scatter bar assist features to the plurality of features for a given illumination setting; (2) generating a second set of rules for applying biasing to the plurality of features for said given illumination setting; (3) forming a look-up table containing the first set of rules and the second set of rules; and (4) analyzing each of the plurality of features with the first set of rules and the second set of rules contained in the look-up table to determine if either the first set of rules or the second set of rules is applicable to a given feature. If either the first set of rules or the second set of rules is applicable to the given feature, the given feature is modified in accordance with the applicable rule.

REFERENCES:
patent: 5621652 (1997-04-01), Eakin
patent: 5682323 (1997-10-01), Pasch et al.
patent: 5821014 (1998-10-01), Chen et al.
patent: 6077310 (2000-06-01), Yamamoto et al.
patent: 6078738 (2000-06-01), Garza et al.
patent: 6421820 (2002-07-01), Mansfield et al.
patent: 6523162 (2003-02-01), Agrawal et al.
patent: 6541167 (2003-04-01), Petersen et al.
patent: 6584609 (2003-06-01), Pierrat et al.
patent: 6873720 (2005-03-01), Cai et al.
patent: 2002/0004714 (2002-01-01), Jones et al.
patent: 2003/0082463 (2003-05-01), Laidig et al.
patent: WO 99/14636 (1999-03-01), None
Hewak, Daniel., et al. “Fabrication of tapers and lenslike waveguides by a microcontrolled dip coating procedure.” Applied Optics, vol. 27, No. 21, Nov. 1, 1988, pp. 4562-4564.
Torres, J.A., et al. “Contrast-based assist feature optimization photolithography.” Optical Microlithography XV, Santa Clara CA, Mar. 5-8, 2002, vol. 4691, pp. 179-187, XP 000118756, ISSN: 0277-786X.

Affiliated with

Also associated with

Rating

Automatic optical proximity correction (OPC) rule generation does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Automatic optical proximity correction (OPC) rule generation, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Automatic optical proximity correction (OPC) rule generation will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3714818