Optics: measuring and testing – By configuration comparison – With comparison to master – desired shape – or reference voltage
Patent
1997-06-04
2000-08-22
Kim, Robert H.
Optics: measuring and testing
By configuration comparison
With comparison to master, desired shape, or reference voltage
451 41, G01B 1100
Patent
active
061080934
ABSTRACT:
An automated endpoint detection process for detecting residual metal on a surface of an integrated circuit substrate after subjecting said surface to a chemical-mechanical polishing process is described. The process includes obtaining a baseline reflected radiation signal for a surface on a standard integrated circuit substrate surface that is substantially free of residual metal, directing radiation generated from a radiation source on at least a portion of the surface of the integrated circuit substrate, detecting a resulting reflected radiation signal from the surface of the integrated circuit substrate and comparing the reflected radiation signal to the baseline reflected radiation signal and thereby determining whether residual metal is present on the surface of the integrated circuit substrate.
REFERENCES:
patent: 4772127 (1988-09-01), Chase et al.
patent: 4793895 (1988-12-01), Kaanta et al.
patent: 4794264 (1988-12-01), Quackenbos et al.
patent: 4898471 (1990-02-01), Stonestrom et al.
patent: 4943734 (1990-07-01), Johnson et al.
patent: 5032217 (1991-07-01), Tanaka
patent: 5036015 (1991-07-01), Sandhu et al.
patent: 5049816 (1991-09-01), Moslehi
patent: 5058982 (1991-10-01), Katzir
patent: 5076692 (1991-12-01), Neukermans et al.
patent: 5081421 (1992-01-01), Miller et al.
patent: 5151584 (1992-09-01), Ebbing et al.
patent: 5153668 (1992-10-01), Katzir et al.
patent: 5169491 (1992-12-01), Doan
patent: 5196353 (1993-03-01), Sandu et al.
patent: 5222329 (1993-06-01), Yu
patent: 5240552 (1993-08-01), Yu et al.
patent: 5245790 (1993-09-01), Jerbic
patent: 5245794 (1993-09-01), Salugsugan
patent: 5265378 (1993-11-01), Rostoker
patent: 5272115 (1993-12-01), Sato
patent: 5308438 (1994-05-01), Cote et al.
patent: 5310455 (1994-05-01), Pasch et al.
patent: 5321304 (1994-06-01), Rostoker
patent: 5337015 (1994-08-01), Lustig et al.
patent: 5355212 (1994-10-01), Wells et al.
patent: 5389194 (1995-02-01), Rostoker et al.
patent: 5389794 (1995-02-01), Allen et al.
patent: 5399234 (1995-03-01), Yu et al.
patent: 5403228 (1995-04-01), Pasch
patent: 5405806 (1995-04-01), Pfiester et al.
patent: 5439551 (1995-08-01), Meikle et al.
patent: 5483568 (1996-01-01), Yano et al.
patent: 5492594 (1996-02-01), Burke et al.
patent: 5516400 (1996-05-01), Pasch et al.
patent: 5531861 (1996-07-01), Yu et al.
patent: 5559428 (1996-09-01), Li et al.
patent: 5561541 (1996-10-01), Sharp et al.
patent: 5563702 (1996-10-01), Emery et al.
patent: 5572598 (1996-11-01), Wihl et al.
patent: 5595526 (1997-01-01), Yau et al.
patent: 5597442 (1997-01-01), Chen et al.
patent: 5609511 (1997-03-01), Moriyama et al.
patent: 5624304 (1997-04-01), Pasch et al.
patent: 5626715 (1997-05-01), Rostoker
patent: 5639388 (1997-06-01), Kimura et al.
patent: 5643046 (1997-07-01), Katakabe et al.
patent: 5643050 (1997-07-01), Chen
patent: 5644221 (1997-07-01), Li et al.
patent: 5647952 (1997-07-01), Chen
patent: 5658183 (1997-08-01), Sandhu et al.
patent: 5660672 (1997-08-01), Li et al.
patent: 5663797 (1997-09-01), Sandu
patent: 5664987 (1997-09-01), Renteln
patent: 5667424 (1997-09-01), Pan
patent: 5667433 (1997-09-01), Mallon
patent: 5667629 (1997-09-01), Pan et al.
patent: 5668063 (1997-09-01), Fry et al.
patent: 5670410 (1997-09-01), Pan
patent: 5672091 (1997-09-01), Takahashi et al.
patent: 5674784 (1997-10-01), Jang et al.
patent: 5695660 (1997-12-01), Litvak
patent: 5700180 (1997-12-01), Sandhu et al.
patent: 5705435 (1998-01-01), Chen
patent: 5708506 (1998-01-01), Birang
patent: 5710076 (1998-01-01), Dai et al.
patent: 5712185 (1998-01-01), Tsai et al.
patent: 5722875 (1998-03-01), Iwashita et al.
patent: 5741171 (1998-04-01), Sarfaty et al.
patent: 5777739 (1998-07-01), Sandhu et al.
patent: 5835225 (1998-11-01), Thakur
patent: 5861055 (1999-01-01), Allman et al.
patent: 5865666 (1999-02-01), Nagahara
patent: 5868608 (1999-02-01), Allman et al.
patent: 5882251 (1999-03-01), Berman et al.
patent: 5888120 (1999-03-01), Doran
patent: 5893756 (1999-04-01), Berman et al.
patent: 5931719 (1999-08-01), Nagahara et al.
patent: 5948697 (1999-09-01), Hata
patent: 5957757 (1999-09-01), Berman
Kim Robert H.
LSI Logic Corporation
Nguyen Tu T.
LandOfFree
Automated inspection system for residual metal after chemical-me does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Automated inspection system for residual metal after chemical-me, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Automated inspection system for residual metal after chemical-me will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-587141