Stock material or miscellaneous articles – Structurally defined web or sheet – Discontinuous or differential coating – impregnation or bond
Reexamination Certificate
2006-05-02
2006-05-02
Pham, Long (Department: 2814)
Stock material or miscellaneous articles
Structurally defined web or sheet
Discontinuous or differential coating, impregnation or bond
C438S253000, C438S254000, C438S255000, C438S257000, C438S258000, C118S102000, C118S103000
Reexamination Certificate
active
07037574
ABSTRACT:
An atomic layer deposition (ALD) process deposits thin films for microelectronic structures, such as advanced gap and tunnel junction applications, by plasma annealing at varying film thicknesses to obtain desired intrinsic film stress and breakdown film strength. The primary advantage of the ALD process is the near 100% step coverage with properties that are uniform along sidewalls. The process provides smooth (Ra˜2 Å), pure (impurities<1 at. %), AlOxfilms with improved breakdown strength (9–10 MV/cm) with a commercially feasible throughput.
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Bubber Randhir S.
Gopinath Sanjay
Mao Ming
Omstead Thomas R.
Paranjpe Ajit P.
Baker & Botts L.L.P.
Pham Long
Rao Shrinivas H.
Veeco Instruments Inc.
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