Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Reexamination Certificate
2008-08-29
2011-12-27
Meeks, Timothy (Department: 1715)
Coating processes
Direct application of electrical, magnetic, wave, or...
Plasma
C428S698000
Reexamination Certificate
active
08084104
ABSTRACT:
A metal film composed of multiple atomic layers continuously formed by atomic layer deposition of Ru and Ta or Ti includes at least a top section and a bottom section, wherein an atomic composition of Ru, Ta or Ti, and N varies in a thickness direction of the metal film. The atomic composition of Ru, Ta or Ti, and N in the top section is represented as Ru(x1)Ta/Ti(y1)N(z1)wherein an atomic ratio of Ru(x1)/(Ta/Ti(y1)) is no less than 15, and z1 is 0.05 or less. The atomic composition of Ru, Ta or Ti, and N in the bottom section is represented as Ru(x2)Ta/Ti(y2)N(z2)wherein an atomic ratio of Ru(x2)/(Ta/Ti(y2)) is more than zero but less than 15, and z2 is 0.10 or greater.
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pate
Jeong Daekyun
Namba Kunitoshi
Shinriki Hiroshi
ASM Japan K.K.
Knobbe Martens Olson & Bear LLP
Meeks Timothy
Miller, Jr. Joseph
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