Assembly and method for making in process thin film thickness me

Optics: measuring and testing – By configuration comparison – With photosensitive film or plate

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356357, G01B 1106

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active

056402422

ABSTRACT:
An assembly for making thickness measurements in a thin film structure. The assembly comprises a chemical-mechanical planarization (CMP) subassembly for effecting topographical changes in a thin film structure; and, a measuring subassembly for detecting the thickness of a thin film structure, the measuring subassembly interposed with the CMP subassembly so that a thickness measurement can be made during and independent of CMP process operations.

REFERENCES:
patent: 5333049 (1994-07-01), Ledger
patent: 5409538 (1995-04-01), Nakayama et al.
patent: 5413941 (1995-05-01), Koos et al.
patent: 5436725 (1995-07-01), Ledger
patent: 5452953 (1995-09-01), Ledger
patent: 5486701 (1996-01-01), Norton et al.

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