Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – On insulating substrate or layer
Reexamination Certificate
2007-07-10
2007-07-10
Whitehead, Jr., Carl (Department: 2813)
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
On insulating substrate or layer
C438S030000
Reexamination Certificate
active
11068146
ABSTRACT:
Array substrates for use in TFT-LCDs and fabrication methods thereof. A transparent conductive layer, a first metal layer, a first insulating layer, a semiconductor layer, a second insulating layer and a sacrificial layer are sequentially formed on a substrate. With a first photomask, a photoresist layer with various thicknesses is formed on part of the sacrificial layer. Using the photoresist layer as an etching mask, a gate line having a gate, a channel layer on the gate, a gate pad at the end portion of the gate line, a pixel electrode and a source pad are defined. An insulating spacer is formed on the sidewalls of the gate and gate line. With a second photomask, a source line, source and drain are formed. The source pad connects the end portion of the source line. An array substrate is thus obtained with only two photomasks.
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Jr. Carl Whitehead
McCall-Shepard Sonya
Quanta Display Inc.
Thomas Kayden Horstemeyer & Risley
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