Array substrate and method of manufacturing the same

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – On insulating substrate or layer

Reexamination Certificate

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Details

C257S059000, C257S072000, C257SE21521

Reexamination Certificate

active

07625782

ABSTRACT:
According to an embodiment of the invention, an array substrate includes a first test line, a second test line, a first source line group, a second source line group, a plurality of gate lines and a switching device. The first test line extends along a first direction. The second test line is substantially in parallel with the first test line. The first source line group that extends along a second direction that is substantially perpendicular to the first direction, and electrically connected to the first test line. The second source line group extends along the second direction and is electrically connected to the second test line. Each of the gate lines extends along the first direction. The switching device is formed on a region surrounded by the first source line, the second source line and the gate lines. Therefore, defects induced by static electricity generated during manufacturing process are reduced.

REFERENCES:
patent: 6246074 (2001-06-01), Kim et al.
patent: 6590624 (2003-07-01), Lee
patent: 6734925 (2004-05-01), Lee et al.
patent: 6784862 (2004-08-01), Kodate et al.
patent: 7268838 (2007-09-01), Lim
patent: 7379126 (2008-05-01), Kim et al.
patent: 2002-277896 (2002-09-01), None
English Abstract, Publication No. JP 2002-277896.

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