Arrangement for shadow-casting lithography

Details Arrangement for shadow-casting lithography Arrangement for shadow-casting lithography

1997-08-18

1999-02-23

Nguyen, Kiet T.

Radiant energy

With charged particle beam deflection or focussing

Magnetic lens

2504922, H01J 37317

Patent

active

058747397

ABSTRACT:
An arrangement for shadow-casting lithography by focusing electrically charged particles for the purpose of imaging structures of a mask on a substrate disposed immediately to the rear thereof, comprising a particle source (2) and an extraction system (3) which produces a divergent particle beam issuing from a substantially point-shaped virtual source, and comprising a lens (6) for focusing the divergent particle beam which comprises an electrode arrangement (6a, 6b, 6c, 6d, 6e, 6f, 6g, 6h) which includes at least one electrostatic collector lens (6a to 6f in conjunction with an electrostatic diverging lens (6g, 6h) in order to be able to compensate lens errors of the collector lens in a purposeful manner with respect to lens errors of the diverging lens and to render possible a predeterminable change in the imaging scale. The diverging lens is preferably disposed in the beam direction at a distance to the rear of the collector lens in immediate proximity of the mask in order to be able to use the mask as a grating for the diverging lens.

REFERENCES:
patent: 5742062 (1998-04-01), Stengl et al.

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