4. Radiant energy
  5. Irradiation of objects or material
  6. Irradiation of semiconductor devices

Alfred Chalupka

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Arrangement for masked beam lithography by means of electrically

Radiant energy – With charged particle beam deflection or focussing – Magnetic lens
Patent

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Arrangement for shadow-casting lithography

Radiant energy – With charged particle beam deflection or focussing – Magnetic lens
Patent

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Arrangement for stabilizing an irradiated mask

Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Patent

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Electrostatic lens

Radiant energy – With charged particle beam deflection or focussing – Magnetic lens
Reexamination Certificate

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Ion source

Radiant energy – Ion generation – Field ionization type
Patent

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Profile ID: LFUS-PAI-P-469492

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