Aromatic oligomers

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface

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430328, 430270, 430287, 430288, 522144, 522188, G03C 516, G03C 500

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active

049562665

ABSTRACT:
Compositions comprising an oligomer which (a) on average comprises at least one in-chain residue of the general formula ##STR1## wherein Ar.sup.1 is an aromatic group, R.sup.1 is hydrogen or a hydrocarbyl group, X is a group which activates Ar.sup.1 to electrophilic attack, and Y.sup.1 is an organic residue bearing a carboxyl substituent; and (b) has one or more pendant and/or terminal acyloxymethyl groups are described. They may be used in dental, electronic and electrical applications.

REFERENCES:
patent: 3025260 (1962-03-01), Luck et al.
patent: 4252888 (1981-02-01), Rohloff
patent: 4379826 (1983-04-01), Economy
patent: 4379866 (1983-04-01), Henry, Jr. et al.
patent: 4435496 (1984-03-01), Walls et al.

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