Aqueous developer solution having hydroxy-alkyl piperidine for p

Details Aqueous developer solution having hydroxy-alkyl piperidine for p Aqueous developer solution having hydroxy-alkyl piperidine for p

1994-05-09

1996-04-23

Chu, John S. Y.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430192, 430193, 43027015, 430331, G03C 530

Patent

active

RE0352179

ABSTRACT:
An aqueous developer solution contains, as a water-soluble basic compound, a compound of the general formula (I) ##STR1## where R.sup.1 to R.sup.5 are identical or different and are each H, OH, hydroxyalkyl, alkoxy or alkyl.
It is suitable for developing positive-working photoresists.

REFERENCES:
patent: 4192929 (1980-03-01), Wingfield, Jr.
patent: 4576903 (1986-03-01), Baron et al.
patent: 4820621 (1989-04-01), Tanka et al.
patent: 4833067 (1989-05-01), Tanaka et al.
patent: 4863828 (1989-10-01), Kawabe et al.
patent: 4877719 (1989-10-01), Higashi et al.
patent: 4929605 (1990-05-01), Domet et al.
Aldrich Chemical Catalog p. 1065.
Novolak Resins used in Positive Resist Systems, T. R. Pampalone Solid State Technology, Jun. 1984 pp. 115-120.
Evaluations of Pure Novolak Cresol-Formaldehyde Resins for Deep U.V. Lithography, Gipstein et al. J. Chem. Soc. Jan. 1982 pp. 201-205.

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