Aqueous developer solution having hydroxy-alkyl piperidine for p

Details Aqueous developer solution having hydroxy-alkyl piperidine for p Aqueous developer solution having hydroxy-alkyl piperidine for p

1989-08-09

1991-08-13

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430192, 430193, 430270, 430331, G03C 530

Patent

active

050395955

ABSTRACT:
An aqueous developer solution contains, as a water-soluble basic compound, a compound of the general formula (I) ##STR1## where R.sup.1 to R.sup.5 are identical or different and are each H, OH, hydroxyalkyl, alkoxy or alkyl.
It is suitable for developing positive-working photoresists.

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Novolac Resins Used in Positive Resist Systems, T. R. Pampalone, Solid State Technology, Jun. 1984, pp. 115-120.
Evaluation of Pure Novolak Cresol-Formaldehyde Resins for Deep U.V. Lithography, Gipstein et al., J. Chem. Soc. Jan. 1982, 201-205.
Aldrich Chemical Catalog p. 1065.

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