Aqueous developable deep UV negative resist

Details Aqueous developable deep UV negative resist Aqueous developable deep UV negative resist

1992-11-23

1993-11-02

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430270, 430271, 430275, 430277, 430278, 522 52, 522 63, 522 68, 522166, G06C 500

Patent

active

052582655

ABSTRACT:
A radiation-sensitive mixture useful as a negative-working photoresist composition comprising:

REFERENCES:
patent: 4343885 (1982-08-01), Reardon, Jr.
patent: 4649100 (1987-03-01), Leyrer et al.
patent: 4740450 (1988-04-01), Tamaoki et al.
patent: 4902603 (1990-02-01), Slater et al.
Chemical Abstract No. 108(7):55225f, by McAuley, Iain; Krogh, Erik; and Wan, Peter from the Journal of American Chemical Society, 110(2), 600-2.
Abstract No. 77(14):92787c by Takacs, Mihaly; Kertesz, Piroska; Vegh, Antal; and Simonyi, Istvan from the Acta Pharmaceutical of Hungari, 42(4), 177-82.
Chemical Abstract 106(10):76147f, Onishi et al., Photosensitive Compositions, Jul. 12, 1991.

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