Apparatuses and methods for cleaning a substrate

Details Apparatuses and methods for cleaning a substrate Apparatuses and methods for cleaning a substrate

2008-09-14

2009-12-01

Kornakov, Michael (Department: 1792)

Cleaning and liquid contact with solids

Processes

With work or work parts movable during treatment

C134S042000, C134S902000, C134S015000, C134S025400, C015S077000, C015S088300

Reexamination Certificate

active

07625452

ABSTRACT:
A method for cleaning a substrate is provided. The method includes providing foam to a surface of the substrate, brush scrubbing the surface of the substrate, providing pressure to the foam, and channeling the pressured foam to produce jammed foam, the channeling including channeling the pressured foam into a gap, the gap being defined by a space between a surface of a brush enclosure and the surface of the substrate. The brush scrubbing of the surface of the substrate and the channeling of the pressured foam across the surface of the substrate facilitate particle removal from the surface of the substrate.

REFERENCES:
patent: 4817652 (1989-04-01), Liu et al.
patent: 9-139372 (1997-05-01), None

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