Brushing – scrubbing – and general cleaning – Machines – Brushing
Reexamination Certificate
2004-03-31
2008-10-28
Guidotti, Laura C (Department: 3723)
Brushing, scrubbing, and general cleaning
Machines
Brushing
C134S902000, C015S088300, C015S102000, C015S302000
Reexamination Certificate
active
07441299
ABSTRACT:
An apparatus for use in processing a substrate includes a brush enclosure extending over a length. The brush enclosure is configured to be disposed over a surface of the substrate and has an open region that is configured to be disposed in proximity to the substrate. The open region extends over the length of the brush enclosure and enables foam from within the brush enclosure to contact the surface of the substrate. A substrate cleaning system and method for cleaning a substrate are also described.
REFERENCES:
patent: 3037887 (1962-06-01), Brenner et al.
patent: 3212762 (1965-10-01), Carroll et al.
patent: 3436262 (1969-04-01), Crowe et al.
patent: 3617095 (1971-11-01), Lissant
patent: 3978176 (1976-08-01), Voegeli
patent: 4085059 (1978-04-01), Smith et al.
patent: 4133773 (1979-01-01), Simmons
patent: 4156619 (1979-05-01), Griesshammer
patent: 4205911 (1980-06-01), Dole
patent: 4238244 (1980-12-01), Banks
patent: 4781764 (1988-11-01), Leenaars
patent: 4817652 (1989-04-01), Liu et al.
patent: 4838289 (1989-06-01), Kottman et al.
patent: 4849027 (1989-07-01), Simmons
patent: 4911761 (1990-03-01), McConnell et al.
patent: 4962776 (1990-10-01), Liu et al.
patent: 5000795 (1991-03-01), Chung et al.
patent: 5048549 (1991-09-01), Hethcoat
patent: 5102777 (1992-04-01), Lin et al.
patent: 5105556 (1992-04-01), Kurokawa et al.
patent: 5113597 (1992-05-01), Sylla
patent: 5175124 (1992-12-01), Winebarger
patent: 5181985 (1993-01-01), Lampert et al.
patent: 5226969 (1993-07-01), Watanabe et al.
patent: 5242669 (1993-09-01), Flor
patent: 5271774 (1993-12-01), Leenaars et al.
patent: 5288332 (1994-02-01), Pustilnik et al.
patent: 5301387 (1994-04-01), Thomas et al.
patent: 5306350 (1994-04-01), Hoy et al.
patent: 5336371 (1994-08-01), Chung et al.
patent: 5415191 (1995-05-01), Mashimo et al.
patent: 5417768 (1995-05-01), Smith et al.
patent: 5464480 (1995-11-01), Matthews
patent: 5472502 (1995-12-01), Batchelder
patent: 5494526 (1996-02-01), Paranjpe
patent: 5498293 (1996-03-01), Ilardi et al.
patent: 5656097 (1997-08-01), Olesen et al.
patent: 5660642 (1997-08-01), Britten
patent: 5705223 (1998-01-01), Bunkofske
patent: 5800626 (1998-09-01), Cohen et al.
patent: 5858283 (1999-01-01), Burris
patent: 5900191 (1999-05-01), Gray et al.
patent: 5904156 (1999-05-01), Advocate, Jr. et al.
patent: 5908509 (1999-06-01), Olesen et al.
patent: 5911837 (1999-06-01), Matthews
patent: 5932493 (1999-08-01), Akatsu et al.
patent: 5944581 (1999-08-01), Goenka
patent: 5944582 (1999-08-01), Talieh
patent: 5945351 (1999-08-01), Mathuni
patent: 5951779 (1999-09-01), Koyanagi et al.
patent: 5964954 (1999-10-01), Matsukawa et al.
patent: 5964958 (1999-10-01), Ferrell et al.
patent: 5968285 (1999-10-01), Ferrell et al.
patent: 5997653 (1999-12-01), Yamasaka
patent: 6048409 (2000-04-01), Kanno et al.
patent: 6049996 (2000-04-01), Freeman et al.
patent: 6081650 (2000-06-01), Lyons et al.
patent: 6090217 (2000-07-01), Kittle
patent: 6092538 (2000-07-01), Arai et al.
patent: 6152805 (2000-11-01), Takahashi
patent: 6158445 (2000-12-01), Olesen et al.
patent: 6167583 (2001-01-01), Miyashita et al.
patent: 6228563 (2001-05-01), Starove et al.
patent: 6267125 (2001-07-01), Bergman et al.
patent: 6270584 (2001-08-01), Ferrell et al.
patent: 6272712 (2001-08-01), Gockel et al.
patent: 6276459 (2001-08-01), Herrick et al.
patent: 6286231 (2001-09-01), Bergman et al.
patent: 6290780 (2001-09-01), Ravkin
patent: 6296715 (2001-10-01), Kittle
patent: 6319801 (2001-11-01), Wake et al.
patent: 6352082 (2002-03-01), Mohindra et al.
patent: 6386956 (2002-05-01), Sato et al.
patent: 6398975 (2002-06-01), Mertens et al.
patent: 6401734 (2002-06-01), Morita et al.
patent: 6423148 (2002-07-01), Aoki
patent: 6439247 (2002-08-01), Kittle
patent: 6457199 (2002-10-01), Frost et al.
patent: 6491043 (2002-12-01), Mohindra et al.
patent: 6491764 (2002-12-01), Mertens et al.
patent: 6493902 (2002-12-01), Lin
patent: 6513538 (2003-02-01), Chung et al.
patent: 6514921 (2003-02-01), Kakizawa
patent: 6527870 (2003-03-01), Gotikis
patent: 6532976 (2003-03-01), Huh et al.
patent: 6537915 (2003-03-01), Moore et al.
patent: 6562726 (2003-05-01), Torek et al.
patent: 6576066 (2003-06-01), Namatsu
patent: 6594847 (2003-07-01), Krusell et al.
patent: 6616772 (2003-09-01), de Larios et al.
patent: 6643893 (2003-11-01), Momonoi et al.
patent: 6733596 (2004-05-01), Mikhaylichenko et al.
patent: 6787473 (2004-09-01), Andreas
patent: 6797071 (2004-09-01), Kittle
patent: 6802911 (2004-10-01), Lee et al.
patent: 6846380 (2005-01-01), Dickinson et al.
patent: 6851435 (2005-02-01), Mertens et al.
patent: 6874516 (2005-04-01), Matsuno et al.
patent: 6896826 (2005-05-01), Wojtczak et al.
patent: 6927176 (2005-08-01), Verhaverbeke et al.
patent: 6946396 (2005-09-01), Miyazawa et al.
patent: 6951042 (2005-10-01), Mikhaylichenko et al.
patent: 7122126 (2006-10-01), Fuentes
patent: 2002/0094684 (2002-07-01), Hirasaki et al.
patent: 2002/0112312 (2002-08-01), Lin
patent: 2002/0121290 (2002-09-01), Tang et al.
patent: 2002/0185164 (2002-12-01), Tetsuka et al.
patent: 2002/0195121 (2002-12-01), Kittle
patent: 2003/0075204 (2003-04-01), De Larios et al.
patent: 2003/0148903 (2003-08-01), Bargaje et al.
patent: 2003/0171239 (2003-09-01), Patel et al.
patent: 2003/0226577 (2003-12-01), Orll et al.
patent: 2004/0002430 (2004-01-01), Verhaverbeke
patent: 2004/0053808 (2004-03-01), Raehse et al.
patent: 2004/0134515 (2004-07-01), Castrucci
patent: 2004/0159335 (2004-08-01), Montierth et al.
patent: 2004/0163681 (2004-08-01), Verhaverbeke
patent: 2004/0261823 (2004-12-01), de Larios
patent: 2005/0045209 (2005-03-01), Tan
patent: 2005/0132515 (2005-06-01), Boyd et al.
patent: 2005/0133060 (2005-06-01), de Larios et al.
patent: 2005/0133061 (2005-06-01), de Larios et al.
patent: 2005/0159322 (2005-07-01), Min et al.
patent: 2005/0176606 (2005-08-01), Konno et al.
patent: 2005/0183740 (2005-08-01), Fulton et al.
patent: 2006/0201267 (2006-09-01), Liu
patent: 2006/0283486 (2006-12-01), de Larios et al.
patent: 2006/0285930 (2006-12-01), de Larios et al.
patent: 2007/0000518 (2007-01-01), Korolik et al.
patent: 40-38-587 (1992-06-01), None
patent: 0827188 (1998-03-01), None
patent: 0905746 (1999-03-01), None
patent: 11-334874 (1999-12-01), None
patent: 0989600 (2000-03-01), None
patent: 53-076559 (1978-07-01), None
patent: 56-084618 (1981-07-01), None
patent: 56-084619 (1981-07-01), None
patent: 59-24849 (1984-02-01), None
patent: 60-005529 (1985-01-01), None
patent: S62-119543 (1987-05-01), None
patent: 63-077510 (1988-04-01), None
patent: 5-15857 (1993-01-01), None
patent: 06-177101 (1994-06-01), None
patent: 07-006993 (1995-01-01), None
patent: H11-350169 (1999-12-01), None
patent: 2001-064688 (2001-03-01), None
patent: 2002-66475 (2002-03-01), None
patent: 2002-280330 (2002-09-01), None
patent: 2002-309638 (2002-10-01), None
patent: 2003-282513 (2003-10-01), None
patent: 2005-194294 (2005-07-01), None
patent: WO-99/16109 (1999-04-01), None
patent: WO-00/33980 (2000-06-01), None
patent: WO 00/59006 (2000-10-01), None
patent: WO-01/12384 (2001-02-01), None
patent: WO-02/101795 (2002-12-01), None
patent: WO-2005/006424 (2005-01-01), None
patent: WO 2005/064647 (2005-07-01), None
Computer generated English translation of JP 5-15857.
Kirkpatrick et al., “Advanced Wafer-Cleaning Evolution,” Solid State Technology, May 2003, www.solid-state.com.
Weaire et al., “The Physics of Foams,” Department of Physics, Trinity College, Dublin, 1999.
Kittle et al., “Photoresist Removal Using Aqueous Foam,” found on the internet: http://www.aquafoam.com/papers/A2C2photoresist.pdf., 2001.
Kittle et al., “Aqueous Foam Drying and Cleaning of Semiconductor Wafers,” found on the internet: http://www.aquafoam.com/papers/SCCPresentation.pdf.
Kittle et al., “Foam Wafer Cleaning—Experimental Proof of Concept <http://www.aquafoam.com/papers/Removalall.pdf>”.
Kittle, et al., “Particulate Removal Using a Foam Medium <http://www.aquafoam.com/papers/particulate.pdf>”.
Kittle, “Removing Particles w
de Larios John M.
Owczarz Aleksander
Redeker Fritz
Schoepp Alan
Guidotti Laura C
Lam Research Corporation
Martine & Penilla & Gencarella LLP
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