Apparatus with plasma radiation source and method of forming...

Radiant energy – Radiant energy generation and sources – With radiation modifying member

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C250S492200, C250S493100, C250S505100, C250S515100, C250S50400H

Reexamination Certificate

active

07825390

ABSTRACT:
An apparatus for forming a beam of electromagnetic radiation includes a plasma radiation source, and a foil trap provided with a plurality of thin foils that extend substantially parallel to the direction of radiation from the plasma source. A grid is disposed between the plasma radiation source and the foil trap. A space is located between the grid and the foil trap. The apparatus also include an electrical potential application circuit that is constructed and arranged to apply an electrical potential to the grid so that the grid repels electrons emitted by the plasma radiation source and creates a positive space charge between the grid and the foil trap to deflect ions emitted by the plasma radiation source to the foil trap.

REFERENCES:
patent: 3814972 (1974-06-01), Sain
patent: 6377651 (2002-04-01), Richardson et al.
patent: 6521897 (2003-02-01), Lindquist et al.
patent: 6838684 (2005-01-01), Bakker et al.
patent: 6906788 (2005-06-01), Bakker et al.
patent: 7145132 (2006-12-01), Bakker et al.
patent: 2004/0130694 (2004-07-01), Kurt et al.
patent: 2004/0135985 (2004-07-01), Bakker et al.
patent: 2004/0141165 (2004-07-01), Zukavishvili et al.
patent: 2005/0098741 (2005-05-01), Bakker et al.
patent: 2005/0133727 (2005-06-01), Banine et al.
patent: 2005/0279946 (2005-12-01), Rettig et al.
patent: 2006/0138960 (2006-06-01), Derra et al.
patent: 2006/0146413 (2006-07-01), Klunder et al.
patent: 2006/0219950 (2006-10-01), Bakker et al.
patent: 2006/0289761 (2006-12-01), Nabet et al.
patent: 2010/0084549 (2010-04-01), Ermakov et al.
patent: 1 243 970 (2002-09-01), None
patent: 1 391 785 (2004-02-01), None
patent: 1 422 570 (2004-05-01), None
International Search Report and Written Opinion for International Application No. PCT/NL/2008/050082 dated Apr. 29, 2008.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Apparatus with plasma radiation source and method of forming... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus with plasma radiation source and method of forming..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus with plasma radiation source and method of forming... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4151098

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.