Apparatus using hybrid coupled plasma

Details Apparatus using hybrid coupled plasma Apparatus using hybrid coupled plasma

2004-07-14

2008-10-28

Hassanzadeh, Parviz (Department: 1792)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With radio frequency antenna or inductive coil gas...

C156S345430, C156S345440, C156S345470, C118S7230ER, C118S7230IR

Reexamination Certificate

active

07442273

ABSTRACT:
A hybrid coupled plasma type apparatus includes: a chamber having a gas-injecting unit; an electrostatic chuck in the chamber; an insulating plate over the gas-injecting unit; a high frequency generator; an impedance matching circuit connected to the high frequency generator; first and second antennas connected to the impedance matching circuit in parallel, a power of the high frequency generator being supplied to the first and second antennas; an electrode of a plate shape connected to one of the first and second antennas in serial, the power of the high frequency generator being supplied to the electrode; and a power distributor between the high frequency generator and one of the first and second antennas.

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patent: WO03/029513 (2003-04-01), None

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