Apparatus to manufacture semiconductor

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – Having glow discharge electrode gas energizing means

Reexamination Certificate

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C156S345430, C118S7230AN

Reexamination Certificate

active

11116224

ABSTRACT:
An apparatus to manufacture a semiconductor includes a plasma-limiting device to limit a plasma region in a reaction chamber. The plasma-limiting device includes a first limiting device to limit the plasma region in the reaction chamber to a first plasma region, a second limiting device to limit the plasma region in the reaction chamber to a second plasma region having an area larger than an area of the first plasma region, and a driving device to simultaneously move the first and second limiting devices to vary the plasma region.

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patent: 6823815 (2004-11-01), Han et al.
patent: 6910441 (2005-06-01), Jang
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patent: 11040553 (1999-02-01), None
patent: 2004-063663 (2004-02-01), None
patent: 2004-072110 (2004-03-01), None
patent: 2004-088051 (2004-03-01), None
patent: 1020030090192 (2003-11-01), None
patent: 1020030093794 (2003-12-01), None

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