Apparatus of manufacturing a semiconductor device

Coating apparatus – Gas or vapor deposition – Crucible or evaporator structure

Reexamination Certificate

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C118S715000

Reexamination Certificate

active

06966951

ABSTRACT:
An apparatus of manufacturing a semiconductor device includes a chamber having an outlet, a susceptor in the chamber to hold a substrate thereon, a source material container supplying the chamber with a source material, a liquid mass flow controller connected to the source material container, a plurality of vaporizers connected to the liquid mass flow controller, a plurality of source gas injectors, each of which is connected to each vaporizer and one end of each of which projects into the chamber, a reactive gas container supplying the chamber with a reactive gas, and a plurality of reactive gas injectors connected to the reactive gas container, one end of each of which projects into the chamber.

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patent: 2000-150499 (2000-05-01), None

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