Apparatus for retaining a workpiece in a process chamber within

Electricity: electrical systems and devices – Electric charge generating or conducting means – Use of forces of electric charge or field

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279128, H02N 1300

Patent

active

060348631

ABSTRACT:
Apparatus for retaining a workpiece in a process chamber of a semiconductor wafer processing system. The apparatus has a thermal transfer element, an electrostatic chuck on top of the thermal transfers element and a clamping ring that secures the chuck to the thermal transfer element in a predefined orientation. The detachable, "keyed" chuck permits rapid exchange of wafer support platforms for increased productivity and consistent placement of same upon the thermal transfer element for reliable processing conditions.

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patent: 5421401 (1995-06-01), Sherstinsky et al.
patent: 5532903 (1996-07-01), Kendall
patent: 5671117 (1997-09-01), Sherstinsky et al.
patent: 5805408 (1998-09-01), Maraschin et al.

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