Apparatus for retaining a workpiece in a process chamber within

Details Apparatus for retaining a workpiece in a process chamber within Apparatus for retaining a workpiece in a process chamber within

1997-11-12

2000-03-07

Fleming, Fritz

Electricity: electrical systems and devices

Electric charge generating or conducting means

Use of forces of electric charge or field

279128, H02N 1300

Patent

active

060348631

ABSTRACT:
Apparatus for retaining a workpiece in a process chamber of a semiconductor wafer processing system. The apparatus has a thermal transfer element, an electrostatic chuck on top of the thermal transfers element and a clamping ring that secures the chuck to the thermal transfer element in a predefined orientation. The detachable, "keyed" chuck permits rapid exchange of wafer support platforms for increased productivity and consistent placement of same upon the thermal transfer element for reliable processing conditions.

REFERENCES:
patent: 4645218 (1987-02-01), Ooshio et al.
patent: 5320982 (1994-06-01), Tsubone et al.
patent: 5421401 (1995-06-01), Sherstinsky et al.
patent: 5532903 (1996-07-01), Kendall
patent: 5671117 (1997-09-01), Sherstinsky et al.
patent: 5805408 (1998-09-01), Maraschin et al.

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