Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1990-03-16
1991-04-23
Weisstuch, Aaron
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
C23C 1454
Patent
active
050097644
ABSTRACT:
Techniques for removing an electrical short caused by a flake in a thin film sputtering system are disclosed. The flake typically bridges the dark space between target and anode or shield and is removed through manipulation of the power supply utilized for normal operations. Sensing of the flake and discrimination between recoverable arcs is accomplished by timing the duration of an over-current condition. Removal involves switching between power mode or some other initial mode of regulation and current modes and progressively increasing current to melt the flake. Circuitry automatically removes the flake and is easily adapted to power supplies particularly more sophisticated, high frequency, lower energy storage DC supplies.
REFERENCES:
patent: 4103324 (1978-07-01), Vandervelden et al.
patent: 4610775 (1986-09-01), Phifer
Harpold John G.
Schatz Douglas S.
Siefkes Jerry D.
Advanced Energy Industries Inc.
Santangelo Luke
Weisstuch Aaron
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