Apparatus for processing wafer-shaped substrates

Material or article handling – Device for emptying portable receptacle – Nongravity type

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414937, 414941, 414225, 414627, 4147443, 414752, 901 46, B65G 100

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active

053642228

ABSTRACT:
An apparatus for coating and developing a resist on a wafer comprises a carrier station provided with a plurality of carriers for receiving wafers and transfer tables, a processing section having a plurality of processing units, and a transfer robot provided between the carrier station and the processing section. The robot comprises a plate-shaped arm for transferring wafers between the carriers and the transfer tables, and two horseshoe-shaped forks for transferring wafers between the processing units and transfer tables. The robot is movable along a transfer path so as to make the arm and forks face the carriers, processing units and transfer tables.

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patent: 4985722 (1991-01-01), Ushijima et al.
patent: 5083896 (1992-01-01), Uehara et al.
patent: 5133635 (1992-07-01), Malin et al.
patent: 5183370 (1993-02-01), Cruz
patent: 5217340 (1993-06-01), Harada et al.

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