Optics: measuring and testing – By polarized light examination – Of surface reflection
Reexamination Certificate
2005-04-19
2005-04-19
Smith, Zandra V. (Department: 2877)
Optics: measuring and testing
By polarized light examination
Of surface reflection
C356S630000
Reexamination Certificate
active
06882421
ABSTRACT:
Systems and methods are disclosed for evaluating nitrogen levels in thin gate dielectric layers formed on semiconductor samples. In one embodiment, a tool is disclosed which includes both a narrow band ellipsometer and a broadband spectrometer for measuring the sample. The narrowband ellipsometer provides very accurate information about the thickness of the thin film layer while the broadband spectrometer contains information about the nitrogen levels. In another aspect of the subject invention, a thermal and/or plasma wave detection system is used to provide information about the nitrogen levels and nitration processes.
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Opsal Jon
Wen Youxian
Smith Zandra V.
Stallman & Pollock LLP
Therma-Wave, Inc.
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