Apparatus for metal plasma vapor deposition and re-sputter...

Details Apparatus for metal plasma vapor deposition and re-sputter... Apparatus for metal plasma vapor deposition and re-sputter...

2008-07-15

2008-07-15

Paschall, Mark H (Department: 3742)

Electric heating

Metal heating

By arc

C219S121410, C219S121520, C118S7230IR, C204S298380, C315S111510

Reexamination Certificate

active

11052011

ABSTRACT:
A plasma reactor includes a vacuum chamber including a sidewall, a ceiling and a wafer support pedestal near a floor of the chamber, and a vacuum pump coupled to the chamber. A process gas inlet is coupled to the chamber and a process gas source coupled to the process gas inlet. The reactor further includes a metal sputter target at the ceiling, a high voltage D.C. source coupled to the sputter target, an RF plasma source power generator coupled to the wafer support pedestal and having a frequency suitable for exciting kinetic electrons, and an RF plasma bias power generator coupled to the wafer support pedestal and having a frequency suitable for coupling energy to plasma ions.

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