Apparatus for measuring the beam current of charged particle bea

Radiant energy – Inspection of solids or liquids by charged particles – Positive ion probe or microscope type

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250492A, H01J 3700, G01N 2300

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active

040114490

ABSTRACT:
In an ion implantation apparatus, a structure for measuring the beam current at the target wherein a Faraday Cage is formed by walls adjacent to and electrically insulated from the target in combination with the target, means for biasing the target at a negative potential, means for biasing the walls at ground potential and means for measuring the target current and the wall current and for combining the two to provide an accurate beam current measurement.

REFERENCES:
patent: 3117022 (1974-01-01), Bronson et al.
patent: 3535516 (1970-10-01), Munakata
patent: 3689766 (1972-09-01), Freeman
patent: 3778626 (1973-12-01), Robertson
"A Simple Source for Implantation Doping of Semiconductors" Gwozdz et al., Rev. of Sci. Inst., vol. 41, No. 11, Nov. 1970, pp. 1667-1678.

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