Apparatus for measuring pedestal temperature in a semiconductor

Thermal measuring and testing – Temperature measurement – In spaced noncontact relationship to specimen

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374121, 2503381, 118712, G01M 1500

Patent

active

058936432

ABSTRACT:
Apparatus for measuring wafer support pedestal temperature in a semiconductor wafer processing system. The apparatus measures infrared energy emitted by the bottom of the pedestal via a tube having one end inserted in a bore through the underside of the cathode pedestal base. The distal end of the tube is coupled to a temperature sensor. Both the tube and temperature sensor are fitted with insulating sleeve adapters to suppress unwanted RF signals from coupling to the sensor.

REFERENCES:
patent: 4435092 (1984-03-01), Iuchi
patent: 4842683 (1989-06-01), Cheng et al.
patent: 5249142 (1993-09-01), Shirakawa et al.
patent: 5549756 (1996-08-01), Sorensen et al.
patent: 5598014 (1997-01-01), Barany et al.

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