Radiant energy – Inspection of solids or liquids by charged particles – Analyte supports
Reexamination Certificate
2006-08-24
2009-02-03
Vanore, David A. (Department: 2881)
Radiant energy
Inspection of solids or liquids by charged particles
Analyte supports
C250S398000, C250S400000, C250S440110, C250S442110
Reexamination Certificate
active
07485874
ABSTRACT:
This apparatus for manufacturing semiconductor substrates has support disks and holding units holding semiconductor substrates on the support disks. The holding unit has a stopper which is formed of a conductive material and holds the brim of the semiconductor substrate, a stopper holder which supports the stopper at the outer circumferential portion thereof, a retaining member which retains the stopper to the support disk, and a heating unit which heats the stopper.
REFERENCES:
patent: 3845312 (1974-10-01), Allison, Jr.
patent: 4873447 (1989-10-01), Imahashi
patent: 4883968 (1989-11-01), Hipple et al.
patent: 5004924 (1991-04-01), Imahashi
patent: 5134301 (1992-07-01), Kamata et al.
patent: 5244820 (1993-09-01), Kamata et al.
patent: 5525807 (1996-06-01), Hirokawa et al.
patent: 5608223 (1997-03-01), Hirokawa et al.
patent: 5932883 (1999-08-01), Hashimoto et al.
patent: 6570171 (2003-05-01), Tomita et al.
patent: 6614190 (2003-09-01), Tomita et al.
patent: 6667485 (2003-12-01), Tomita et al.
patent: 6667486 (2003-12-01), Ohta et al.
patent: 7217934 (2007-05-01), Mori
patent: 7314785 (2008-01-01), Yamazaki et al.
patent: 2005/0087769 (2005-04-01), Yamazaki et al.
patent: 2005/0218336 (2005-10-01), Mori
patent: 2007/0114458 (2007-05-01), Nakamura et al.
patent: 2008/0105877 (2008-05-01), Yamazaki et al.
Japanese Unexamined Patent Application, First Publication No. 2002-231176 corresponding to U.S. Patent No. 6,614,190.
Bando Akira
Hayashi Tsuneo
Kasamatsu Riyuusuke
Kurosawa Yoichi
Mera Kazuo
Kolisch Hartwell PC
Souw Bernard E
Sumco Corporation
Vanore David A.
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