Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Patent
1990-03-01
1991-10-01
Berman, Jack I.
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
250398, H01J 37317
Patent
active
050536273
ABSTRACT:
An apparatus for particle implantation is disclosed employing a plurality of particle generators to effectively process wafers of other target substrates carried on a rotating end station. The invention is particularly useful in SIMOX processes where implanted oxygen ions form a buried oxide layer in silicon wafers. In one embodiment, two or more stationary particle generators are disposed at different sectors of a circular track along which the wafers travel to expose the wafers in sequence as they pass. The ion sources can also be offset regularly from each other to increase the radial exposure area. In an other embodiment, the apparatus can further include at least one particle generator which scans the rotating end station in a radial direction as it rotates to insure that uniform ion doses are achieved.
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Guerra Michael A.
Ruffell John P.
Berman Jack I.
Engellenner Thomas J.
Ibis Technology Corporation
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