Apparatus for inspecting mask used for manufacturing integrated

Details Apparatus for inspecting mask used for manufacturing integrated Apparatus for inspecting mask used for manufacturing integrated

1984-11-26

1986-11-18

Evans, F. L.

Optics: measuring and testing

By configuration comparison

With comparison to master, desired shape, or reference voltage

382 8, 356398, 356375, G01B 1100

Patent

active

046232567

ABSTRACT:
A mask inspection apparatus is arranged to compare a measured data signal obtained by optically measuring a photomask with a design data signal representing an integrated circuit pattern so as to inspect defects of the photomask on which the integrated circuit pattern is drawn. To inspect the pattern area and its peripheral area of the mask in one step, a reference signal generator in the mask inspection apparatus is arranged to generate a reference signal containing a predetermined additional data signal representing the peripheral area of the integrated circuit pattern, in addition to the design data signal representing the integrated circuit pattern. The reference signal is compared with the measured data signal of the pattern area and its peripheral area.

REFERENCES:
patent: 3963354 (1976-06-01), Feldman et al.
patent: 4218142 (1980-08-01), Kryger et al.
patent: 4441207 (1984-04-01), Lougheed et al.
patent: 4481664 (1984-11-01), Linger et al.
patent: 4491962 (1985-01-01), Sakou et al.
patent: 4555798 (1985-11-01), Broadbent, Jr. et al.
Goto et al., Proc. of the Fourth International Joint Conf. on Pattern Recognition, 1978, p. 970.
"Automatic Mask Reticle Defect Inspection Device": T. Tokoishi, Electronics Material, Sep. 1983.
"Reticle Defect Inspection System": D. Awamura, Electronics Material, Sep. 1983.

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