Coating apparatus – Gas or vapor deposition – With treating means
Patent
1994-07-05
1996-11-26
Breneman, R. Bruce
Coating apparatus
Gas or vapor deposition
With treating means
118715, 432241, 219390, 219406, C23C 1600
Patent
active
055781322
ABSTRACT:
A heat treating unit for semiconductor processing is adapted to conduct normal pressure high temperature processing and low pressure thermal processing using corrosive gases. The unit includes an inner tube for receiving a boat which carries objects to be processed, an outer tube concentrically disposed outside the inner tube, a cylindrical manifold which has a gas feed port and an exhaust port, and a cap which tightly closes an opening of the manifold. The inner tube, outer tube and manifold are formed of quartz which is heat resistant and corrosion resistant, and these three components are integrally joined together by melting. The interior surface of the cap is provided with a protecting layer which is heat resistant and corrosion resistant. A connection between the cap and the manifold includes a high temperature heat resistant seal in which O-rings are cooled by a cooling system.
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Kobayashi Toshiki
Yamaga Kenichi
Breneman R. Bruce
Lund Jeffrie R.
Tokyo Electron Kabushiki Kaisha
Tokyo Electron Tohoku Kabushiki Kaisha
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