Apparatus for depositing particles onto a wafer

Details Apparatus for depositing particles onto a wafer Apparatus for depositing particles onto a wafer

1996-10-03

1998-05-05

Ozaja, Donald E.

Coating apparatus

Control means responsive to a randomly occurring sensed...

Condition of coated material

118688, 118712, 427 8, 437 8, G03G 1510, G01R 3126

Patent

active

057468320

ABSTRACT:
An apparatus for depositing particles onto a wafer comprises a particle generator; particle size controller connected to an output terminal of the particle generator, a first transmitting tube connected to an output of the particle size controller; a second and a third transmitter connected to an output terminal of the first transmitting tube; a first counter connected to an output terminal of the second transmitting tube; a particle depositor connected to an output terminal of the third transmitter; a second counter connected to the particle depositor; and a power supplier connected to the particle depositor. The apparatus and a method for depositing the particles onto the wafer provide a wafer on which particles of known size and kind are deposited. Also, the particles of a different kind and size are deposited on the same wafer.

REFERENCES:
patent: 5194297 (1993-03-01), Scheer et al.

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