Apparatus for controlling matching network of a vacuum plasma pr

Details Apparatus for controlling matching network of a vacuum plasma pr Apparatus for controlling matching network of a vacuum plasma pr

1995-12-29

1998-08-11

Pascal, Robert

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

31511151, 333 173, H03H 740

Patent

active

057931623

ABSTRACT:
A load including a plasma discharge in a vacuum plasma processing chamber is matched to an r.f. source that supplies sufficient power to the discharge to maintain the discharge. A matching network connected between the source and a plasma excitation component of the chamber includes first and second variable reactances. A microprocessor causes the value of the first reactance to be varied while the value of the other reactance stays constant until power reflected from the load to output terminals of the source is minimized. The microprocessor causes the value of the second reactance to then be varied while the value of the first reactance stays constant until reflected power is minimized. The reactance values are alternately changed until the reflected minimum power does not change, at which time there is a match. To initiate the discharge, the microprocessor causes the value of the one reactance to change while the value of the other reactance stays constant.

REFERENCES:
patent: 3995237 (1976-11-01), Brunner
patent: 4375051 (1983-02-01), Theall
patent: 4951009 (1990-08-01), Collins
patent: 5187454 (1993-02-01), Collins et al.
patent: 5383019 (1995-01-01), Farrell et al.
patent: 5629653 (1997-05-01), Stimson

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