Apparatus for controlling etch rate when using consumable electr

Details Apparatus for controlling etch rate when using consumable electr Apparatus for controlling etch rate when using consumable electr

1999-07-01

2000-02-29

Breneman, Bruce

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

118723E, 118712, C23F 102, C23C 1600

Patent

active

060304898

ABSTRACT:
A method and apparatus to improve process control during plasma etching of semiconductor substrates. Improvements are directed towards controlling the rate of etching when using consumable electrodes. Consumable electrode materials are used to increase selectivity in certain plasma etching processes as in via. contact. or in SOG etch. A consumable electrode material has a significant effect on processing time due to changing gap dimension between electrodes. This invention teaches how to adjust for process variables by using feedback from two strategically placed pressure manometers.

REFERENCES:
patent: 3708419 (1973-01-01), Low et al.
patent: 4609562 (1986-09-01), Isenberg et al.
patent: 4886547 (1989-12-01), Mizukami
patent: 5138973 (1992-08-01), Davis et al.
patent: 5245153 (1993-09-01), Singer et al.
patent: 5336355 (1994-08-01), Zarowin et al.
patent: 5344542 (1994-09-01), Maher et al.
patent: 5354413 (1994-10-01), Smesny et al.
patent: 5387842 (1995-02-01), Roth et al.
patent: 5635021 (1997-06-01), Harafugi
patent: 5645642 (1997-07-01), Nishizato et al.
patent: 5652029 (1997-07-01), Itoh

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