Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1997-12-15
2000-08-01
Warden, Sr., Robert J.
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20429808, C23C 1432, C23C 1454
Patent
active
060961740
ABSTRACT:
An apparatus is provided for coating a substrate (24) with thin layers from targets (12, 13) between which a gas discharge plasma is sustained in order to produce the ions necessary for the bombardment of the targets (12, 13) connected to alternating current. The process chamber (6) contains a gas under a specific partial pressure. The targets (12, 13) are connected to a power source in such a circuit so that they alternately form the cathode and anode of the gas discharge. The reversal of the current direction is performed through an H bridge (4) formed of four switches (16 to 19), the conductor (14) connecting the H bridge (4) to a first power source (3) being connected through a branch line (21) to a second power source which can be connected by a switch (20) to ground. All switches (19 to 20) are operated by a control circuit in a regular and variable mode, the ion energy being controlled by the level of the potential difference between the cathode and the coating and the number of ions through the duration of this potential
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Derwent record for DD 252 205, month and year unknown.
Derwent record for DE 195 06 515, month and year unknown.
Derwent record for DE 195 060 513, month and year unknown.
Derwent record for DE 44 38 463, month and year unknown.
Derwent record for DE 42 42 633, month and year unknown.
Szczyrbowski Joachim
Teschner Gotz
Leybold Systems GmbH
Olsen Kaj K.
Warden, Sr. Robert J.
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