Coating apparatus – Gas or vapor deposition
Reexamination Certificate
2006-11-06
2010-12-14
Kackar, Ram N (Department: 1716)
Coating apparatus
Gas or vapor deposition
C156S345330, C156S345340
Reexamination Certificate
active
07850779
ABSTRACT:
Embodiments of the invention provide an apparatus configured to form a material during an atomic layer deposition (ALD) process, such as a plasma-enhanced ALD (PE-ALD) process. In one embodiment, a lid assembly for conducting a vapor deposition process within a process chamber is provided which includes an insulation cap and a plasma screen. In one example, the insulation cap has a centralized channel configured to flow a first process gas from an upper surface to an expanded channel and an outer channel configured to flow a second process gas from an upper surface to a groove which is encircling the expanded channel. In one example, the plasma screen has an upper surface containing an inner area with a plurality of holes and an outer area with a plurality of slots. The insulation cap may be positioned on top of the plasma screen to form a centralized gas region with the expanded channel and a circular gas region with the groove.
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Chu Schubert S.
Ganguli Seshadri
Ma Paul
Marcadal Christophe
Shah Kavita
Applied Materisals, Inc.
Chandra Satish
Kackar Ram N
Patterson & Sheridan LLP
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