Apparatus and methods for plasma vapor deposition processes

Details Apparatus and methods for plasma vapor deposition processes Apparatus and methods for plasma vapor deposition processes

2008-01-29

2008-01-29

Meeks, Timothy (Department: 1762)

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

C427S248100, C427S569000, C427S508000, C118S7230MW

Reexamination Certificate

active

07323231

ABSTRACT:
One aspect of the invention is directed toward a method of forming a conductive layer on a microfeature workpiece. In one embodiment, the method comprises placing a microfeature workpiece in a vapor reaction chamber, depositing an electrically conductive material onto the microfeature workpiece in a vapor deposition process by flowing a gas into a plasma zone of the vapor deposition chamber and transmitting energy into the plasma zone via a transmitting window. The energy transmitted through the window and into the plasma zone produces plasma from the gas. The plasma produced from the gas forms a conductive layer on the workpiece and a residual film on the window. This embodiment of the method further includes changing the residual film on the window to have a reduced transmissivity to the energy.

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