Apparatus and method of removing particles

Details Apparatus and method of removing particles Apparatus and method of removing particles

2005-06-15

2008-11-11

Norton, Nadine (Department: 1792)

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

C216S030000, C430S329000, C430S003000, C430S330000, C427S064000, C427S066000, C427S067000, C427S350000

Reexamination Certificate

active

07448396

ABSTRACT:
An impurities elimination apparatus including a base plate, a first nozzle for removing impurities on the base plate using air suction, a glass substrate disposed on the base plate, and a second nozzle for coating the glass substrate with an organic material.

REFERENCES:
patent: 4631250 (1986-12-01), Hayashi
patent: 6155275 (2000-12-01), Shinbara
patent: 2001/0000477 (2001-04-01), Harada

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