Apparatus and method of detecting a substrate in a carrier head

Details Apparatus and method of detecting a substrate in a carrier head Apparatus and method of detecting a substrate in a carrier head

2005-03-29

2005-03-29

Wilson, Lee D. (Department: 3723)

Abrading

Precision device or process - or with condition responsive...

With indicating

C451S288000, C451S041000, C451S005000

Reexamination Certificate

active

06872122

ABSTRACT:
A method of detecting a substrate in a carrier head for a chemical mechanical polishing system includes connecting a chamber in a carrier head to a pressure source, measuring the pressure in the chamber as a function of time, calculating the derivative of the pressure in the chamber, and determining whether the substrate is adjacent a substrate receiving surface in the carrier head from the derivative.

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