Brushing – scrubbing – and general cleaning – Machines – Wiping
Patent
1997-11-14
2000-12-12
Markoff, Alexander
Brushing, scrubbing, and general cleaning
Machines
Wiping
15 77, 15 882, 134902, 134 6, A47L 2500
Patent
active
061580759
ABSTRACT:
A substrate washing apparatus, comprising a spin chuck for holding and rotating a substrate W, a brushing section including a scrubbing member which is brought into contact with a washing surface of the substrate held on the spin chuck and revolved on its own axis together with rotation of the spin chuck, a washing liquid supply mechanism for supplying a washing liquid through the brushing section onto the washing surface of the substrate, a pressure control mechanism for controlling a pressing force of the scrubbing member against the washing surface of the substrate, and a moving means for moving the scrubbing member relative to the substrate in a radial direction of the substrate, wherein the scrubbing member includes an abutting portion which is brought into contact with the washing surface of the substrate, and a non-contact peripheral portion positioned about the abutting portion and formed not to contact the washing surface of the substrate when the abutting portion is in contact with the washing surface of the substrate.
REFERENCES:
patent: 4476601 (1984-10-01), Oka
patent: 5169408 (1992-12-01), Biggerstaff et al.
patent: 5311634 (1994-05-01), Andros
patent: 5345639 (1994-09-01), Tanoue et al.
patent: 5375291 (1994-12-01), Tateyama et al.
patent: 5518542 (1996-05-01), Matsukawa et al.
patent: 5624501 (1997-04-01), Gill, Jr.
patent: 5636401 (1997-06-01), Yonemizu et al.
patent: 5647083 (1997-07-01), Sugimoto et al.
patent: 5664254 (1997-09-01), Ohkura et al.
patent: 5685039 (1997-11-01), Hamada et al.
patent: 5778481 (1998-07-01), Amsden et al.
patent: 5868866 (1999-02-01), Maekawa et al.
patent: 5870792 (1999-02-01), Shurliff
patent: 5906687 (1999-05-01), Masui et al.
patent: 6006391 (1999-12-01), Shurliff et al.
Kubota Minoru
Miyamoto Ken'ichi
Swanson Walter
Tanaka Hideya
Markoff Alexander
Tokyo Electron Limited
LandOfFree
Apparatus and method for washing substrate does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Apparatus and method for washing substrate, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus and method for washing substrate will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-204798