4. Brushing, scrubbing, and general cleaning
  5. Machines
  6. Wiping

Hideya Tanaka

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Apparatus and method for developing resist coated on substrate

Photography – Fluid-treating apparatus – Fluid application to one side only of photographic medium
Patent

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Apparatus and method for washing substrate

Brushing – scrubbing – and general cleaning – Machines – Wiping
Patent

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Apparatus and method for washing substrate

Cleaning and liquid contact with solids – Processes – Combined
Patent

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Apparatus and method for washing substrate

Cleaning and liquid contact with solids – Processes – Using solid work treating agents
Reexamination Certificate

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Apparatus for developing a resist-coated substrate

Photography – Fluid-treating apparatus – Fluid application to one side only of photographic medium
Patent

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Profile ID: LFUS-PAI-P-374872

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