Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Reexamination Certificate
2005-01-18
2005-01-18
McDonald, Rodney G. (Department: 1753)
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
C204S192150, C204S192200, C204S298060, C204S298150, C204S298250, C118S719000, C118S720000, C118S728000, C118S729000, C118S500000, C216S067000, C156S345310, C156S345510, C156S345540, C427S128000, C427S130000, C427S131000, C427S132000
Reexamination Certificate
active
06843892
ABSTRACT:
An in-line, multi-station apparatus including an improved pallet for transporting a plurality of workpieces/substrates through the apparatus, the pallet comprising:(a) a sheet of electrically conductive material provided with a plurality of spaced-apart regions extending at least partway therethrough, each of the regions adapted to mount therein and expose at least one major surface of respective workpieces/substrates for receipt of the treatment; and(b) a plurality of electrical contact means for selectively and controllably electrically contacting respective ones of said plurality of workpieces/substrates for applying an electrical bias potential thereto during treatment.Embodiments include in-line apparatus for performing bias sputtering of electrically conductive thin films on insulative substrates in the manufacture of multi-layer magnetic and/or magneto-optical recording media.
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McDermott & Will & Emery
McDonald Rodney G.
Seagate Technology LLC
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