Coating apparatus – Gas or vapor deposition – Multizone chamber
Patent
1996-04-12
1999-06-22
Breneman, R. Bruce
Coating apparatus
Gas or vapor deposition
Multizone chamber
20429825, 20429835, 156345, 414217, 414939, 251326, 251329, L23C 1600
Patent
active
059139781
ABSTRACT:
A gas is supplied to a second chamber so that the pressure in the second chamber is raised to a predetermined level. A communication passage is provided for internally connecting the first and second chambers. When the pressure in the first chamber attains the predetermined level, the gas is allowed to flow from the second chamber into the first chamber through the communication passage. A gas flow can be checked when an open-close door is opened to connect the chambers. Thus, there is no substantial gas flow, so that particles can be prevented from being flung up.
REFERENCES:
patent: 4167915 (1979-09-01), Toole et al.
patent: 4785962 (1988-11-01), Toshima
patent: 5186718 (1993-02-01), Tepman et al.
patent: 5277215 (1994-01-01), Yanagawa et al.
patent: 5388944 (1995-02-01), Takanabe et al.
patent: 5474410 (1995-12-01), Ozawa et al.
Kato Susumu
Muraoka Sunao
Ozawa Masahito
Breneman R. Bruce
Lund Jeffrie R
Tokyo Electron Ltd.
Varian Japan K.K.T
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