4. Coating apparatus
  5. Gas or vapor deposition
  6. Multizone chamber

Sunao Muraoka

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Apparatus and method for regulating pressure in two chambers

Coating apparatus – Gas or vapor deposition – Multizone chamber
Patent

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Microwave plasma processing device and gate valve for...

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means
Reexamination Certificate

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Profile ID: LFUS-PAI-P-1627028

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