Apparatus and method for in-situ monitoring of chemical mechanic

Details Apparatus and method for in-situ monitoring of chemical mechanic Apparatus and method for in-situ monitoring of chemical mechanic

1996-02-22

1999-10-12

Eley, Timothy V.

Abrading

Precision device or process - or with condition responsive...

By optical sensor

451285, B24B 4900, B24B 5100

Patent

active

059646438

ABSTRACT:
An in-situ method of measuring uniformity of a layer on a substrate during polishing of said layer, where the method includes the steps of directing a light beam toward the layer during polishing; monitoring an interference signal produced by the light beam reflecting off of the substrate; and computing a measure of uniformity from the interference signal.

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