Apparatus and method for hybrid chemical processing

Details Apparatus and method for hybrid chemical processing Apparatus and method for hybrid chemical processing

2009-08-20

2011-12-06

Zervigon, Rudy (Department: 1716)

Coating apparatus

Gas or vapor deposition

C156S345290, C156S345350, C118S7230IR, C118S7230ER, C118S7230ME

Reexamination Certificate

active

08070879

ABSTRACT:
In one embodiment, an apparatus for performing an atomic layer deposition (ALD) process is provided which includes a chamber body containing a substrate support, a lid assembly attached to the chamber body, a remote plasma system (RPS) in fluid communication with the reaction zone, a centralized expanding conduit extending through the lid assembly and expanding radially outwards, a first gas delivery sub-assembly configured to deliver a first process gas, and a second gas delivery sub-assembly configured to deliver a second process gas into the centralized expanding conduit. The first gas delivery sub-assembly contains an annular channel encircling and in fluid communication with the centralized expanding conduit, wherein the annular channel is adapted to deliver the first process gas through a plurality of passageways and nozzles and into the centralized expanding conduit. The second gas delivery sub-assembly contains a gas inlet in fluid communication to the centralized expanding conduit.

REFERENCES:
patent: 4761269 (1988-08-01), Conger et al.
patent: 4825809 (1989-05-01), Mieno et al.
patent: 4975252 (1990-12-01), Nishizawa et al.
patent: 5024748 (1991-06-01), Fujimura
patent: 5178681 (1993-01-01), Moore et al.
patent: 5887117 (1999-03-01), Desu et al.
patent: 5935490 (1999-08-01), Archbold et al.
patent: 5972430 (1999-10-01), DiMeo, Jr. et al.
patent: 6001267 (1999-12-01), Os et al.
patent: 6161500 (2000-12-01), Kopacz et al.
patent: 6258170 (2001-07-01), Somekh et al.
patent: 6302965 (2001-10-01), Umotoy et al.
patent: 6756235 (2004-06-01), Liu et al.
patent: 6875271 (2005-04-01), Glenn et al.
patent: 6878206 (2005-04-01), Tzu et al.
patent: 6916398 (2005-07-01), Chen et al.
patent: 6921062 (2005-07-01), Gregg et al.
patent: 7017514 (2006-03-01), Shepherd et al.
patent: 7175713 (2007-02-01), Thakur et al.
patent: 7204886 (2007-04-01), Chen et al.
patent: 7228873 (2007-06-01), Ku et al.
patent: 7252716 (2007-08-01), Kim et al.
patent: 7264846 (2007-09-01), Chang et al.
patent: 7402210 (2008-07-01), Chen et al.
patent: 7408225 (2008-08-01), Shinriki et al.
patent: 7591907 (2009-09-01), Chen et al.
patent: 2001/0042523 (2001-11-01), Kesala
patent: 2002/0009896 (2002-01-01), Sandhu et al.
patent: 2002/0076507 (2002-06-01), Chiang et al.
patent: 2002/0110991 (2002-08-01), Li
patent: 2003/0019428 (2003-01-01), Ku et al.
patent: 2003/0079686 (2003-05-01), Chen et al.
patent: 2003/0082301 (2003-05-01), Chen et al.
patent: 2003/0082307 (2003-05-01), Chung et al.
patent: 2003/0101938 (2003-06-01), Ronsse et al.
patent: 2003/0106490 (2003-06-01), Jallepally et al.
patent: 2003/0108674 (2003-06-01), Chung et al.
patent: 2003/0116087 (2003-06-01), Nguyen et al.
patent: 2003/0121608 (2003-07-01), Chen et al.
patent: 2003/0124262 (2003-07-01), Chen et al.
patent: 2003/0129308 (2003-07-01), Chen et al.
patent: 2003/0198740 (2003-10-01), Wendling
patent: 2003/0203616 (2003-10-01), Chung et al.
patent: 2004/0009336 (2004-01-01), Marcadal et al.
patent: 2004/0009665 (2004-01-01), Chen et al.
patent: 2004/0011504 (2004-01-01), Ku et al.
patent: 2004/0048461 (2004-03-01), Chen et al.
patent: 2004/0069227 (2004-04-01), Ku et al.
patent: 2004/0077183 (2004-04-01), Chung
patent: 2004/0187304 (2004-09-01), Chen et al.
patent: 2004/0241321 (2004-12-01), Ganguli et al.
patent: 2004/0256351 (2004-12-01), Chung et al.
patent: 2004/0266175 (2004-12-01), Chen et al.
patent: 2005/0008779 (2005-01-01), Yang et al.
patent: 2005/0009325 (2005-01-01), Chung et al.
patent: 2005/0011555 (2005-01-01), Maula et al.
patent: 2005/0173068 (2005-08-01), Chen et al.
patent: 2005/0257735 (2005-11-01), Guenther
patent: 2007/0003698 (2007-01-01), Chen et al.
patent: 2007/0044719 (2007-03-01), Ku et al.
patent: 2007/0095285 (2007-05-01), Thakur et al.
patent: 2008/0274299 (2008-11-01), Chen et al.
patent: 04087323 (1992-03-01), None
patent: 07-115064 (1995-05-01), None
patent: 10247627 (1998-09-01), None
patent: 11054459 (1999-02-01), None
patent: 2000248361 (2000-09-01), None
patent: 2001507757 (2001-06-01), None
patent: 2002009078 (2002-01-01), None
patent: 2002-252219 (2002-09-01), None
Notice to File a Response issued Dec. 16, 2010 in Korean Application No. 10-2003-0080486.
Office Action dated Apr. 6, 2010 for Japanese Patent Application No. 2003-384954.

Affiliated with

Also associated with

Rating

Apparatus and method for hybrid chemical processing does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus and method for hybrid chemical processing, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus and method for hybrid chemical processing will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4299068