Coating apparatus – Gas or vapor deposition
Reexamination Certificate
2008-07-22
2008-07-22
Zervigon, Rudy (Department: 1792)
Coating apparatus
Gas or vapor deposition
C156S345290
Reexamination Certificate
active
11680995
ABSTRACT:
In one embodiment, an apparatus for performing an atomic layer deposition process is provided which includes a chamber body having a substrate support, a lid assembly attached to the chamber body, and delivery sub-assemblies coupled to the lid assembly and configured to deliver process gases into a centralized expanding conduit, which extends through the lid assembly and expands radially outward. The first gas delivery sub-assembly contains an annular mixing channel encircling and in fluid communication with the centralized expanding conduit, wherein the annular mixing channel is adapted to deliver a first process gas through a plurality of passageways and nozzles and into the centralized expanding conduit. A first gas inlet may be coupled to the annular mixing channel and positioned to provide the first process gas to the annular mixing channel. The second gas delivery sub-assembly contains a second gas inlet in fluid communication to the centralized expanding conduit.
REFERENCES:
patent: 4058430 (1977-11-01), Suntola et al.
patent: 4389973 (1983-06-01), Suntola et al.
patent: 4413022 (1983-11-01), Suntola et al.
patent: 4415275 (1983-11-01), Dietrich
patent: 4761269 (1988-08-01), Conger et al.
patent: 4834831 (1989-05-01), Nishizawa et al.
patent: 4975252 (1990-12-01), Nishizawa et al.
patent: 4993357 (1991-02-01), Scholz
patent: 5024748 (1991-06-01), Fujimura
patent: 5027746 (1991-07-01), Frijlink
patent: 5173327 (1992-12-01), Sandhu et al.
patent: 5178681 (1993-01-01), Moore et al.
patent: 5225366 (1993-07-01), Yoder
patent: 5261959 (1993-11-01), Gasworth
patent: 5281274 (1994-01-01), Yoder
patent: 5294286 (1994-03-01), Nishizawa et al.
patent: 5338362 (1994-08-01), Imahashi
patent: 5374570 (1994-12-01), Nasu et al.
patent: 5441703 (1995-08-01), Jurgensen
patent: 5443647 (1995-08-01), Aucoin et al.
patent: 5480818 (1996-01-01), Matsumoto et al.
patent: 5483919 (1996-01-01), Yokoyama et al.
patent: 5503875 (1996-04-01), Imai et al.
patent: 5558717 (1996-09-01), Zhao et al.
patent: 5674786 (1997-10-01), Turner et al.
patent: 5711811 (1998-01-01), Suntola et al.
patent: 5728223 (1998-03-01), Murakami et al.
patent: 5730802 (1998-03-01), Ishizumi et al.
patent: 5796116 (1998-08-01), Nakata et al.
patent: 5807792 (1998-09-01), Ilg et al.
patent: 5834372 (1998-11-01), Lee
patent: 5835677 (1998-11-01), Li et al.
patent: 5846332 (1998-12-01), Zhao et al.
patent: 5855680 (1999-01-01), Soininen et al.
patent: 5879459 (1999-03-01), Gadgil et al.
patent: 5882411 (1999-03-01), Zhao et al.
patent: 5887117 (1999-03-01), Desu et al.
patent: 5906683 (1999-05-01), Chen et al.
patent: 5916365 (1999-06-01), Sherman
patent: 5923056 (1999-07-01), Lee et al.
patent: 5935490 (1999-08-01), Archbold et al.
patent: 5972430 (1999-10-01), DiMeo, Jr. et al.
patent: 6001267 (1999-12-01), Os et al.
patent: 6015590 (2000-01-01), Suntola et al.
patent: 6015917 (2000-01-01), Bhandari et al.
patent: 6042652 (2000-03-01), Hyun et al.
patent: 6071572 (2000-06-01), Mosely et al.
patent: 6079356 (2000-06-01), Umotoy et al.
patent: 6084302 (2000-07-01), Sandhu
patent: 6099904 (2000-08-01), Mak et al.
patent: 6124158 (2000-09-01), Dautartas et al.
patent: 6139700 (2000-10-01), Kang et al.
patent: 6143082 (2000-11-01), McInerney et al.
patent: 6144060 (2000-11-01), Park et al.
patent: 6156382 (2000-12-01), Rajagopalan et al.
patent: 6162715 (2000-12-01), Mak et al.
patent: 6174377 (2001-01-01), Doering et al.
patent: 6174809 (2001-01-01), Kang et al.
patent: 6183563 (2001-02-01), Choi et al.
patent: 6197683 (2001-03-01), Kang et al.
patent: 6200893 (2001-03-01), Sneh
patent: 6203613 (2001-03-01), Gates et al.
patent: 6206967 (2001-03-01), Mak et al.
patent: 6207487 (2001-03-01), Kim et al.
patent: 6231672 (2001-05-01), Choi et al.
patent: 6251190 (2001-06-01), Mak et al.
patent: 6270572 (2001-08-01), Kim et al.
patent: 6284646 (2001-09-01), Leem
patent: 6287965 (2001-09-01), Kang et al.
patent: 6302965 (2001-10-01), Umotoy et al.
patent: 6305314 (2001-10-01), Sneh et al.
patent: 6306216 (2001-10-01), Kim et al.
patent: 6309713 (2001-10-01), Mak et al.
patent: 6342277 (2002-01-01), Sherman
patent: 6348376 (2002-02-01), Lim et al.
patent: 6358829 (2002-03-01), Yoon et al.
patent: 6372598 (2002-04-01), Kang et al.
patent: 6379748 (2002-04-01), Bhandari et al.
patent: 6391785 (2002-05-01), Satta et al.
patent: 6399491 (2002-06-01), Jeon et al.
patent: 6416577 (2002-07-01), Suntoloa et al.
patent: 6416822 (2002-07-01), Chiang et al.
patent: 6428859 (2002-08-01), Chiang et al.
patent: 6433314 (2002-08-01), Mandrekar et al.
patent: 6447607 (2002-09-01), Soininen et al.
patent: 6451119 (2002-09-01), Sneh et al.
patent: 6451695 (2002-09-01), Sneh
patent: 6454860 (2002-09-01), Metzner et al.
patent: 6468924 (2002-10-01), Lee et al.
patent: 6475276 (2002-11-01), Elers et al.
patent: 6475910 (2002-11-01), Sneh
patent: 6478872 (2002-11-01), Chae et al.
patent: 6481945 (2002-11-01), Hasper et al.
patent: 6482262 (2002-11-01), Elers et al.
patent: 6482733 (2002-11-01), Raaijmakers et al.
patent: 6498091 (2002-12-01), Chen et al.
patent: 6511539 (2003-01-01), Raaijmakers
patent: 6520218 (2003-02-01), Gregg et al.
patent: 6524952 (2003-02-01), Srinivas et al.
patent: 6548112 (2003-04-01), Hillman et al.
patent: 6551406 (2003-04-01), Kilpi
patent: 6551929 (2003-04-01), Kori et al.
patent: 6558509 (2003-05-01), Kraus et al.
patent: 6561498 (2003-05-01), Tompkins et al.
patent: 6569501 (2003-05-01), Chiang et al.
patent: 6572705 (2003-06-01), Suntola et al.
patent: 6578287 (2003-06-01), Aswad
patent: 6579372 (2003-06-01), Park
patent: 6585823 (2003-07-01), Van Wijck
patent: 6593484 (2003-07-01), Yasuhara et al.
patent: 6596602 (2003-07-01), Iizuka et al.
patent: 6599572 (2003-07-01), Saanila et al.
patent: 6607976 (2003-08-01), Chen et al.
patent: 6620723 (2003-09-01), Byun et al.
patent: 6630030 (2003-10-01), Suntola et al.
patent: 6630201 (2003-10-01), Chiang et al.
patent: 6632279 (2003-10-01), Ritala et al.
patent: 6660126 (2003-12-01), Nguyen et al.
patent: 6660622 (2003-12-01), Chen et al.
patent: 6716287 (2004-04-01), Santiago et al.
patent: 6716302 (2004-04-01), Carducci et al.
patent: 6718126 (2004-04-01), Lei
patent: 6720027 (2004-04-01), Yang et al.
patent: 6734020 (2004-05-01), Lu et al.
patent: 6740585 (2004-05-01), Yoon et al.
patent: 6772072 (2004-08-01), Ganguli et al.
patent: 6773507 (2004-08-01), Jallepally et al.
patent: 6777352 (2004-08-01), Tepman et al.
patent: 6778762 (2004-08-01), Shareef et al.
patent: 6784096 (2004-08-01), Chen et al.
patent: 6790773 (2004-09-01), Drewery et al.
patent: 6797108 (2004-09-01), Wendling
patent: 6800173 (2004-10-01), Chiang et al.
patent: 6803272 (2004-10-01), Halliyal et al.
patent: 6815285 (2004-11-01), Choi et al.
patent: 6818094 (2004-11-01), Yudovsky
patent: 6821563 (2004-11-01), Yudovsky
patent: 6827815 (2004-12-01), Hytros et al.
patent: 6831004 (2004-12-01), Byun et al.
patent: 6838125 (2005-01-01), Chung et al.
patent: 6841200 (2005-01-01), Kraus et al.
patent: 6846516 (2005-01-01), Yang et al.
patent: 6866746 (2005-03-01), Lei et al.
patent: 6868859 (2005-03-01), Yudovsky
patent: 6875271 (2005-04-01), Glenn et al.
patent: 6878206 (2005-04-01), Tzu et al.
patent: 6881437 (2005-04-01), Ivanov et al.
patent: 6893915 (2005-05-01), Park et al.
patent: 6902624 (2005-06-01), Seidel et al.
patent: 6905541 (2005-06-01), Chen et al.
patent: 6905737 (2005-06-01), Verplancken et al.
patent: 6911093 (2005-06-01), Stacey et al.
patent: 6915592 (2005-07-01), Guenther
patent: 6916398 (2005-07-01), Chen et al.
patent: 6919398 (2005-07-01), Born et al.
patent: 6921062 (2005-07-01), Gregg et al.
patent: 6932871 (2005-08-01), Chang et al.
patent: 6936906 (2005-08-01), Chung et al.
patent: 6939801 (2005-09-01), Chung et al.
patent: 6946033 (2005-09-01), Tsuei et al.
patent: 6951804 (2005-10-01), Seutter et al.
patent: 6953742 (2005-10-01), Chen et al.
patent: 6955211 (2005-10-01), Ku et al.
patent: 6972267 (2005-12-01), Cao et al.
patent: 6974771 (2005-12-01), Chen et al.
patent: 6983892 (2006-01-01), Noorbakhsh et al.
patent: 6994319 (2006-02-01), Yudovsky
patent: 6998014 (2006-02-01), Ch
Chang Mei
Chen Ling
Chung Hua
Ku Vincent W.
Wu Dien-Yeh
Applied Materials Inc.
Patterson & Sheridan LLP
Zervigon Rudy
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